Reference · Chips & LLMs

Semiconductor Value Chain Glossary

Canonical definitions — used across all lessons

Electronic Design AutomationEDA
Software tools used by chip designers to create, simulate, verify, and optimize semiconductor designs. Required to design any modern chip.
Investment: Duopoly (Synopsys, Cadence). ~80–85% gross margins. Very sticky.
IP CoreIP
A reusable block of logic — e.g. a CPU core, USB controller, or memory interface — licensed to chip designers rather than designed from scratch. ARM CPU cores are the most widely licensed IP in history.
Investment: Royalty/licensing model. Near-zero marginal cost. ARM is a near-monopoly in CPU IP.
Fabless
A chip company that designs semiconductors but outsources manufacturing to a foundry. No factory ("fab") ownership. Examples: NVIDIA, AMD, Apple (for its own chips), Qualcomm, Broadcom.
Investment: Capital-light. High margins possible. Revenue tied to design quality and market positioning.
Integrated Device ManufacturerIDM
A company that both designs and manufactures its own chips. Examples: Intel, Samsung, Micron. Capital-intensive but maintains end-to-end control.
Investment: Extremely capital intensive. Requires constant capex. Intel's IDM struggles vs TSMC's specialization illustrate the model's difficulty.
Foundry
A semiconductor manufacturer that makes chips for other companies (fabless firms). TSMC is the dominant pure-play foundry, manufacturing nearly 90% of advanced chips globally.
Investment: ~$15–30B+ per leading-edge fab. Very high barriers. TSMC has near-unassailable process lead.
Wafer
A thin disc of silicon (typically 300mm diameter) on which hundreds of chips are simultaneously manufactured. The basic unit of foundry production. Chip yield = percentage of working chips per wafer.
Investment: Wafer prices and yields are key unit economics. Advanced node wafers cost $15,000–$20,000+ each.
Process Nodee.g. 3nm, 2nm
A marketing label (loosely tied to transistor dimensions) indicating the generation of manufacturing process. Smaller nodes → more transistors per mm², better performance/watt. Labels are not literal measurements.
Investment: Leading-edge node capability is TSMC's main moat. Each new node generation takes 3–5 years and billions to develop.
Lithography
The process of printing circuit patterns onto silicon wafers using light. The central step in chip manufacturing. EUV (Extreme Ultraviolet) lithography enables the smallest, most advanced patterns.
Investment: ASML's monopoly on EUV lithography machines is the hardest chokepoint in the global chip supply chain.
EUV (Extreme Ultraviolet) Lithography
Lithography technology using 13.5nm wavelength light to pattern sub-10nm features on chips. Requires plasma-generated light, ultra-precise optics, and a near-perfect vacuum. Only ASML manufactures EUV machines.
Investment: ~$150–200M per machine. ~1 year installation. No substitute exists. Export controls on EUV to China are a primary US policy lever.
Advanced PackagingCoWoS, HBM, chiplets
Technologies that combine multiple chips (or dies) into one package — connecting them at high bandwidth with short distances. Increasingly determines AI chip performance. Examples: NVIDIA H100/H200 use CoWoS packaging with HBM memory.
Investment: CoWoS capacity (also TSMC) is the current bottleneck for AI chip supply. Expected tight through 2026+.
HBM (High Bandwidth Memory)
Stacked DRAM memory architecture that sits adjacent to (or on top of) a GPU/accelerator die. Provides much higher memory bandwidth than conventional DRAM. Essential for LLM inference and training. Made primarily by SK Hynix, Samsung, Micron.
Investment: HBM is in shortage. SK Hynix has ~50% market share. NVIDIA's AI GPU demand has made HBM suppliers structurally important.
CUDA
NVIDIA's parallel computing platform and programming model. The software ecosystem that makes NVIDIA GPUs the default for AI/ML workloads. Launched 2006. Nearly every major AI framework (PyTorch, TensorFlow) is optimized for CUDA.
Investment: CUDA is NVIDIA's real moat — not the hardware. 18 years of developer ecosystem lock-in is harder to disrupt than manufacturing leadership.
RISC-V
An open-source instruction set architecture (ISA) — a free alternative to ARM's proprietary ISA. Growing adoption in edge chips, custom accelerators, and China (where ARM access is restricted).
Investment: Long-term threat to ARM's licensing model, but ARM's ecosystem advantage (toolchains, software) means displacement will be slow. Watch China adoption as the bellwether.
Tao (τ) Law / Tau Scaling Law
Paradigm proposed by Huawei (He Tingbo, ISCAS 2026). Replaces transistor geometric scaling (Moore's Law) with "temporal scaling" — minimizing the RC time constant (τ) by shortening signal path lengths via 3D chip layout. Implemented through LogicFolding. First commercial chip: Kirin 2026 (autumn 2026).
Investment: Reframes Chinese DUV fabs from "legacy" to "high-performance substrate." Key watch: TechInsights Kirin 2026 teardown for independent density/performance verification.
LogicFolding
Huawei's intra-die 3D chip design method. Folds 2D circuit routing paths into vertical layers within a single die, shortening wire lengths and reducing RC time constants. Distinct from chiplet integration (which bonds separate finished dies). Requires new EDA tooling — Peking University built the first tool in May 2026.
Investment: Claimed 53.5% transistor density improvement on Kirin 2026. Unverified until chip ships. Three challenges: heat dissipation, immature EDA ecosystem, density ≠ performance.
RC Time Constantτ = R × C
In electronics: the time it takes a signal to charge/discharge through a wire. τ = Resistance × Capacitance. Lower τ = faster signal propagation. Wire length is the primary driver — shorter wire = lower R and C = lower τ. The physical basis for Tao's Law.
Investment relevance: Understanding τ lets you evaluate architectural performance claims that go beyond transistor count, such as LogicFolding or interconnect improvements in AI chip design.
Geometric Scaling
The traditional path of Moore's Law: shrink the physical size of transistors to pack more per mm², improving performance and efficiency. Now decelerating as transistors approach atomic scale (~3nm = ~10 atoms across). EUV lithography is required to continue below ~7nm economically.
Investment: The slowdown of geometric scaling is why "node" labels have become partially marketing — and why architectural innovation (3D, chiplets, specialization) is now where real performance gains come from.
DUV Multi-Patterning
Technique to achieve smaller feature sizes using older Deep Ultraviolet (DUV) lithography machines by exposing the same wafer layer multiple times with shifted masks. SMIC uses this to produce "7nm" chips without EUV. Results in lower yield (~20–40% vs TSMC's 90%+), longer production time, and higher cost per chip.
Investment: This is how China's domestic chip production works at "advanced" nodes today. Economically viable only with state subsidies and a captive domestic market.